* Photo Resist Coating Experiment;

data resist;

 label a='developing time'

       b='developing temperature'

       c='exposure'

       edslp='edge slope';



rep   blk     a     b     c   edslp

-----------------------------------

1      1     -1    -1    -1     3.6

1      1     -1     1     1     4.5

1      1      1    -1     1     4.2

1      1      1     1    -1     4.0

1      2     -1    -1     1     5.1

1      2     -1     1    -1     3.9

1      2      1    -1    -1     4.5

1      2      1     1     1     4.9

2      1     -1    -1    -1     5.2

2      1     -1     1     1     5.9

2      1      1    -1     1     5.3

2      1      1     1    -1     5.2

2      2     -1    -1     1     5.2

2      2     -1     1    -1     4.6

2      2      1    -1    -1     4.7

2      2      1     1     1     5.2

3      1     -1     1    -1     4.3

3      1     -1     1     1     5.1

3      1      1    -1    -1     4.5

3      1      1    -1     1     4.6

3      2     -1    -1    -1     4.8

3      2     -1    -1     1     5.2

3      2      1     1    -1     5.2

3      2      1     1     1     5.9

4      1     -1    -1     1     5.9

4      1     -1     1     1     6.4

4      1      1    -1    -1     5.7

4      1      1     1    -1     5.6

4      2     -1    -1    -1     4.3

4      2     -1     1    -1     4.4

4      2      1    -1     1     5.3

4      2      1     1     1     5.6

5      1     -1    -1     1     4.3

5      1     -1     1    -1     4.2

5      1      1    -1     1     4.3

5      1      1     1    -1     4.4

5      2     -1    -1    -1     4.5

5      2     -1     1     1     5.5

5      2      1    -1    -1     4.6

5      2      1     1     1     5.2